The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2002

Filed:

Jul. 29, 1999
Applicant:
Inventors:

Andres Fernandez, Dublin, CA (US);

Marian Mankos, San Francisco, CA (US);

Tai-Hon Philip Chang, Foster City, CA (US);

Kim Lee, Fremont, CA (US);

Steven T. Coyle, Newark, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/150 ;
U.S. Cl.
CPC ...
H01J 3/150 ;
Abstract

A photocathode emitter as a source of electron beams, having an optically transmissive substrate patterned to define a protrusion, heat conducting material occupying the space surrounding the protrusion, and a photoemitter layer over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region at the contact with the top of the protrusion patterned on the substrate, and an emission region opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode to allow higher currents to be achieved from the photocathode and thus permits higher throughput rates in applications including electron beam lithography. In one version, the photocathode is fabricated using microfabrication techniques, to achieve a small emission spot size.


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