The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
Apr. 06, 1999
Wenge Yang, Fremont, CA (US);
Lewis Shen, Cupertino, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
Memory gate stacks having widths of about 0.18 microns to 0.15 microns are formed by trimming a resist mask pattern, having line widths of about 0.25 microns, to a width of about 0.20 microns. An antireflective coating layer such as silicon oxynitride underlying the resist pattern is then etched to form etched silicon oxynitride pattern lines having widths of about 0.18 to 0.15 microns. The etched silicon oxynitride layer is then used for self-aligned etching of underlying layers to form the memory gate stack. Hence, a memory gate can be formed that has a width substantially less than the current photolithography limit during formation of the resist mask pattern.