The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2002

Filed:

Jan. 19, 2001
Applicant:
Inventor:

Kun-Tai Wu, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract

An apparatus and a method for mounting a conditioning disk to a conditioning head for use in a chemical mechanical polishing apparatus. A torroidal-shaped bearing mount is fixedly mounted to a conditioning arm of the CMP apparatus for receiving a ball bearing and a cylinder rotator. A cylinder shaft is mounted inside a cylinder chamber defined by the cylinder rotator and is further equipped with a piston mounted at near a top end of the shaft which has an elastomeric gasket mounted on an outer rim for sealingly engaging a sidewall in the cylinder chamber. A disk holder is mounted to a bottom end of the cylinder shaft by a universal connector/universal mount such that the disk holder, with a conditioning disk mounted thereon, can be operated to follow a contour of the polishing disk by tilting to an angle of at least ±30° from a horizontal plane.


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