The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2002
Filed:
Feb. 12, 1999
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A projection exposure apparatus includes projection optics for projecting a pattern, which has been formed on a mask or reticle, onto a wafer placed on a stage; an XYZ stage on which the substrate is placed and which is movable along the direction of the optic axis of the projection optics and in a direction orthogonal to the direction of the optic axis; a surface position measurement unit capable of measuring a predetermined position along the optic axis of the projection optics and the relative position of the surface of the substrate on the state; and a vibration measurement unit capable of measuring vibration of the projection optics. The XYZ stage is driven and controlled based upon results of measurement from the surface position measurement unit and vibration measurement unit, thereby reducing deviation between the wafer surface and imaging plane and improving contrast and resolving power.