The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6357458 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 19, 2002

Filed:

Apr. 11, 2001
Applicant:
Inventors:

Hiroshi Tanaka, Kurume, JP;

Shinichiro Shimomura, Tosu, JP;

Yuji Kamikawa, Kumamoto-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/04 ; B08B 7/04 ;
U.S. Cl.
CPC ...
B08B 3/04 ; B08B 7/04 ;
Abstract

Wafers (W) is immersed in a cleaning liquid (L) contained in a cleaning tank ( ). The cleaning liquid (L) is supplied into the cleaning tank ( ) so that the cleaning liquid (L) overflows the cleaning tank ( ). The cleaning liquid (L) overflowed the cleaning tank ( ) is filtered, circulated and returned into the cleaning tank ( ). A motor-operated bellows pump ( ) is connected by a suction pipe ( ) to the cleaning tank ( ). A particle counter ( ) for counting particles contained in a sample of the cleaning liquid (L) sampled by the motor-operated bellows pump ( ) is placed on the suction pipe ( ) and connected to the suction side of the motor-operated bellows pump ( ).


Find Patent Forward Citations

Tanaka, Hiroshi. (2002). Cleaning apparatus and cleaning method (U.S. Patent No. 6357458). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6357458

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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