The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2002
Filed:
Jul. 20, 2001
Applicant:
Inventors:
Juen-Kuen Lin, Kaohsiung, TW;
Chien-Hsin Lai, Kaohsiung Hsien, TW;
Peng-Yih Peng, Hsinchu Hsien, TW;
Fu-Yang Yu, Hsinchu, TW;
Assignee:
United Microelectronics, Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F 3/04 ;
U.S. Cl.
CPC ...
B01F 3/04 ;
Abstract
An auxiliary gasline-heating unit is used in a chemical vapor deposition apparatus. The auxiliary gasline-heating unit serves to increase the exit temperature of the mixture of N gas and He-dilute gas in order to prevent TDMAT, Ti[N(CH ) ] , from being condensed and becoming a gasline contaminant when the mixture mixes with the TDMAT and a carrier gas.
Lin, Juen-Kuen. (2002). Auxiliary gasline-heating unit in chemical vapor deposition (U.S. Patent No. 6352244). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6352244
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile