The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2002

Filed:

May. 26, 2000
Applicant:
Inventors:

Hongchin Lin, Taipei, TW;

Shyh-Chyi Wong, Taichung, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/701 ;
U.S. Cl.
CPC ...
H01L 2/701 ;
Abstract

A SOI device structure is formed on a SOI substrate having a body contact. The SOI substrate has an insulating layer thereon and a silicon layer is disposed on the insulating layer. A gate is disposed on the silicon layer. A source region and a drain region are respectively disposed within the silicon layer beside the gate. A body contact is provided at an interface between the insulating layer and the silicon layer wherein the body contact is preferably located between the source region and the gate. The body contact, disposed between the source region and the gate can reduce kink effect and body effect, thereby enhancing the performance of device formed on SOI.


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