The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2002
Filed:
Oct. 22, 1999
Applicant:
Inventors:
Mingming Fang, Naperville, IL (US);
Christopher C. Streinz, Smyrna Mills, ME (US);
Shumin Wang, Naperville, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ; C09C 1/68 ;
U.S. Cl.
CPC ...
B24B 1/00 ; C09C 1/68 ;
Abstract
A method for polishing computer rigid disks comprising bringing at least one surface of the rigid disk into contact with a polishing pad and applying a composition to the rigid disk comprising at least one hydroxylamine additive and colloidal silica to give a polished rigid disk.
Quick Actions:
Fang, Mingming. (2002). Composition and method for polishing rigid disks (U.S. Patent No. 6347978). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6347978
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