The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2002
Filed:
May. 26, 2000
Applicant:
Inventors:
Han-Ming Sheng, Hsin-Chu, TW;
Cheng-Chen Kuo, Kaohsiung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 2/166 ; H01L 2/100 ;
U.S. Cl.
CPC ...
G01R 2/166 ; H01L 2/100 ;
Abstract
A new method and apparatus is provide whereby light diffusion within the light measurement toll has been eliminated. A layer of Anti Reflective Coating is deposited on the outside of the second surface of a quartz mask thereby preventing light that is reflected internally to the quartz mask from exiting the mask. All reflected light is therefor eliminated and, with that, the source of light diffusion is eliminated.