The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2002
Filed:
Oct. 20, 1999
Shinichiro Koga, Utsunomiya, JP;
Shigeyuki Uzawa, Naka-machi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for exposing a substrate to transfer a pattern of an original mask to the substrate includes a detecting unit for detecting a position of a representative point within a representative area in the substrate, a determining unit for determining the positional deviation of each of a plurality of the representative areas from among a plurality of areas in the substrate, based on the detection by the detection unit, a statistical calculation unit for statistically calculating the positional deviation of each area in the substrate, based on the determined positional deviations of the representative areas, a calculating unit for calculating an in-area error in each area, based on the statistically calculated positional deviation of each area, and a correcting unit for correcting the position of the substrate in accordance with the calculated in-area error, to successively process the areas of the substrate.