The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2002
Filed:
Jan. 07, 2000
James A. Bruce, Williston, VT (US);
David V. Horak, Essex Junction, VT (US);
Randy W. Mann, Jericho, VT (US);
Jed H. Rankin, Burlington, VT (US);
Andrew J. Watts, Essex, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A mask ( ) with linewidth compensation and a method of making same. The mask provides for optimized imaging of isolated patterns ( ) and nested patterns ( ) present on the same mask. The compensated mask is formed from an uncompensated mask ( ) and comprises an upper surface ( ) upon which the isolated and nested patterns are formed. The isolated pattern comprises a first segment ( ) having first sidewalls ( S). The nested pattern comprises second segments ( ) proximate each other and having second sidewalls ( S). A partial conformal layer ( ) covers the first segment and has feet ( ) outwardly extending a distance d from the first sidewalls along the upper surface. The feet are preferably of a thickness that partially transmits exposure light.