The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2001
Filed:
Sep. 14, 1998
Yoko Naito, Sagamihara, JP;
Hideaki Amano, Zama, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
It is an object to enhance the degree of freedom for the shape of an obtained magnetic field to enhance the inplane uniformity of thickness of first and second films when the first and second films are continuously formed on a substrate to be treated. A main electromagnetic coil,is provided outside of a plasma chamber,so as to be movable vertically by a lifting shaft,When plasma is produced in a vacuum vessel,by the electron cyclotron resonance between a microwave and a magnetic field to continuously deposit a film of a two-layer structure, which comprises an SiOF film and an SiO,film, on a wafer W with the produced plasma, a process for forming the SiOF film is carried out while the main electromagnetic coil,is arranged so that the lower surface of the coil,is positioned at a lower position than the lower surface of a transmission window,by 139 mm, and a process for forming the SiO,film is carried out while the main electromagnetic coil,is arranged so that the lower surface of the coil,is positioned at a lower position than the lower surface of the transmission,by 157 mm.