The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2001
Filed:
Mar. 24, 2000
Applicant:
Inventors:
Kouichi Okamura, Nishishirakawa, JP;
Fumio Suzuki, Nishishirakawa, JP;
Hisashi Masumura, Nishishirakawa, JP;
Assignee:
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract
A polishing method and a polishing apparatus that are for making contact pressure between a work and a polishing pad substantially uniform within surfaces to obtain a work having good quality. A turn table (,) is supported by a grooved surface of a turn table receiving member (,), the grooved surface being provided with grooves (,) in a straight direction, a work (W) is pressed against a polishing pad (,) adhered to the turn table (,) while flowing polishing slurry, and a polishing is carried out by rotating the work (W) and the turn table (,).