The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2001
Filed:
Mar. 25, 1999
Yoshihiko Naito, Kanagawa-ken, JP;
Ebara Corporation, Tokyo, JP;
Abstract
To provide an electron beam irradiation device capable of avoiding a problem of convergence of an electron beam at the maximum scanning points, and constantly obtaining an irradiated region of uniform energy density, an electron beam irradiation device comprising an electron beam source,an accelerating tube,for accelerating electrons emitted from said electron beam source, a focusing electromagnet,for applying a magnetic field to a high energy electron beam, which is formed by the accelerating tube, for controlling the beam diameter of the electron beam, and an electromagnet,for deflecting and scanning the beam-diameter-controlled electron beam by applying a magnetic field to the electron beam, wherein an electric current component I,which is synchronized with an electric current I,of the scanning electromagnet,is superimposed on an electric current IF of the focusing electromagnet,thereby controlling the electric current I,of the focusing electromagnet in a manner that said beam diameter becomes maximum at the maximum scanning points.