The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2001

Filed:

May. 03, 1999
Applicant:
Inventors:

Sen-Fu Chen, Taipei, TW;

Kuei-Jen Chang, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/328 ;
U.S. Cl.
CPC ...
H01L 2/328 ;
Abstract

A protective tape is applied to the device side of a wafer (to protect it during an operation to grind the back side of the wafer) after the surface has been prepared to present only sloping surfaces to the tape. This profile prevents the otherwise sharp edges of the holes for the bonding pads from cutting into the adhesive of the tape and causing adhesive particles to remain on the wafer surface after the tape has been removed. Particles of resist can interfere with attaching wires to the bonding pads. The tape receiving surface of the wafer is commonly formed by a passivation layer and by bonding pad sites that are exposed through holes in the passivation layer. These sloping profiles can be formed by giving a sloping profile to the holes in the photoresist before the holes are etched. Alternatively the holes can be etched suitably wider at the top than at the bottom.


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