The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2001
Filed:
Jan. 21, 2000
Masamichi Harada, Chigasaki, JP;
Ulvac, Inc., Kanagawa, JP;
Abstract
A tungsten nitride film, having a high growth speed without causing any dusting, is formed. The film forming apparatus,according to the present invention, includes an adhesion preventive container,which is placed in a reactor,and an object on which a film is to be formed,is located in the adhesion preventive container,In a first gas inlet equipment, a first feedstock gas is jetted from a shower nozzle,In a second gas inlet equipment, a second feedstock gas is jetted around the object on which a film is to be formed,between the shower nozzle,and the material,The first feedstock gas and the second feedstock gas attain the surface of the object on which a film is to be formed without being mixed together, which enables the efficient performance of the reaction. Since the adhesion preventive container is heated to 150 to 250° C., neither WF,NH,nor W,N is formed and thus, no dusting is caused.