The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Jun. 22, 2000
Bomy A. Chen, Stormville, NY (US);
Liang-Kai Han, Fishkill, NY (US);
Robert Hannon, Wappingers Falls, NY (US);
Jay G. Harrington, Wappingers Falls, NY (US);
Herbert L. Ho, Cornwall, NY (US);
Hsing-Jen Wann, Briarcliff Manor, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Shallow trench isolation is combined with optional deep trenches that are self-aligned with the shallow trenches, at the corners of the shallow trenches, and have a deep trench width that is controlled by the thickness of a temporary sidewall deposited in the interior of the shallow trench and is limited by the sidewall deposition thickness of the deep trench fill.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile