The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2001
Filed:
Feb. 16, 2001
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
Cleaning liquid supply nozzles,are provided within a processing tank,for cleaning semiconductor wafers W. A distilled water source,and the cleaning liquid supply nozzles,are connected via a distilled water supply pipeline,and a chemical supply tank,and the cleaning liquid supply nozzles,are connected via a chemical supply pipeline,. A flow-rate adjustment valve,is provided in the distilled water supply pipeline,, and the supply of distilled water from the distilled water supply pipeline,to the processing tank,and the supply of a chemical from the chemical supply pipeline,to the processing tank,are switched by a switching valve,. A temperature sensor,is disposed within the processing tank,for detecting the temperature of a processing liquid (the chemical or rinse liquid) therein and a CPU,controls the flow-rate adjustment valve,and the switching valve,on the basis of a temperature signal from the temperature sensor,, so that the time required for the processing can be determined from the temperature of the cleaning liquid, thus improving the cleaning capability and cleaning precision.