The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2001
Filed:
Mar. 24, 2000
Applicant:
Inventors:
Nina G. Chechik, Hockessin, DE (US);
Richard M. Levering, Jr., Hockessin, DE (US);
David B. James, Newark, DE (US);
Lee Melbourne Cook, Steelville, PA (US);
Assignee:
Rodel Holdings Inc., Wilmington, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 2/800 ; C23F 1/700 ;
U.S. Cl.
CPC ...
C23C 2/800 ; C23F 1/700 ;
Abstract
A method is provided for the fabrication of a porous polymeric material by electrophoretic deposition. The porous polymeric material is particularly well suited as a polishing surface for the planarization of semiconductor wafers.