The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Aug. 29, 2000
Applicant:
Inventors:
Stephen E. Knight, Essex Junction, VT (US);
Charles A. Whiting, Milton, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/732 ; G03F 9/00 ; H01J 3/14 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/732 ; G03F 9/00 ; H01J 3/14 ;
Abstract
A method and apparatus according to the present invention achieves improved lithographic printing of semiconductor wafers. An optimum tilt for projection optics in a lithography tool relative to a wafer in a direction perpendicular to a scanning direction is characterized for each of a plurality of wafer technologies and levels. The corresponding optimum tilt is retrieved from a database to adjust the lithography tool accordingly, depending upon what technology and level is being processed.