The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Jan. 18, 2000
Timothy J. Dalton, Ridgefield, CT (US);
Andrew P. Cowley, Wappingers Falls, NY (US);
Peter A. Emmi, Hyde Park, NY (US);
Erdem Kaltalioglu, Wappingers Falls, NY (US);
Vincent J. McGahay, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An on-chip vertically stacked decoupling capacitor includes a hardmask film formed between the capacitor dielectric and the lower electrode. The manufacturing process used to form the capacitor takes advantage of the hardmask film and enables the capacitor to be formed over a low-k dielectric material. Attack of the underlying low-k dielectric material is suppressed during the etching and stripping processes used to form the capacitor, due to the presence of the hardmask. The low-k dielectric film provides for a reduced parasitic capacitance between adjacent conductive wires formed in the low-k dielectric material and therefore provides for increased levels of integration.