The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Oct. 19, 2000
Applicant:
Inventors:
Derrek A. Russell, Scottsdale, AZ (US);
Mirko Vukovic, Gilbert, AZ (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/434 ;
U.S. Cl.
CPC ...
C23C 1/434 ;
Abstract
A cathode arrangement for physical vapor deposition onto substrates with high aspect ratio features for achieving high flat-field uniformity. The cathode arrangement includes two cathodes, a planar cathode and a conical cathode, where the conical cathode is truncated to provide an orifice in which the planar cathode is oriented. The angular distributions of sputtered atoms from the two cathodes complement one another to provide more uniform deposition.
Quick Actions:
Russell, Derrek. (2001). Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features (U.S. Patent No. 6277250). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6277250
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile