The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2001

Filed:

Jun. 03, 1999
Applicant:
Inventors:

Stephen W. Russell, Dallas, TX (US);

Antonio L. P. Rotondaro, Dallas, TX (US);

Donald L. Plumton, Dallas, TX (US);

Duane E. Carter, Plano, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract

A dry etch using CFx in an O2-rich environment will clean the contact/via at the same time it retracts a layer of TiN enclosed in the dielectric layer, such as the plate layer in a Capacitor-Under-Bitline DRAM cell.


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Russell, Stephen. (2001). Simplifying conductive plate/via isolation (U.S. Patent No. 6271078). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6271078

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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