The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2001
Filed:
Feb. 01, 2000
Jenn Ming Huang, Hsin-chu, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
The invention teaches a new method that achieves improvements in the creation of shallow Trench Isolation regions. This improvement is achieved by modifying the mask that is used to create the Shallow Trench Isolation regions. The data file that contains the full description of the photoresist image of Shallow Trench Isolation regions, including Optical Corrections, is subdivided into two files. One of the two files contains the descriptions of Shallow Trench Isolation regions that are arranged in array form, the other file contains the descriptions of Shallow Trench Isolation regions that are arranged as single cells. A suitable bias in the form of a small increase or a small decrease is applied to all of the dimensions that are contained within the files. The two files are merged after which conventional processing proceeds.