The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2001

Filed:

Dec. 16, 1999
Applicant:
Inventor:

Shunji Hakomori, Tokyo, JP;

Assignee:

Speedfam Co., Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 9/06 ;
U.S. Cl.
CPC ...
B24B 9/06 ;
Abstract

To provide a small polishing means featuring high machining efficiency that is capable of efficiently and quickly mirror-polishing an outer periphery of a chamfered workpiece (,) by bringing the outer periphery into even contact with a plurality of polishing drums (,) at the same time. In an apparatus for polishing an outer periphery by bringing an outer periphery of the workpiece (,) retained by workpiece retaining means (,) into contact with two polishing drums (,) simultaneously to perform mirror polishing, the workpiece retaining means (,) are supported by a sliding mechanism (,) such that they may move in a direction in which the two polishing drums (,) are arranged, thereby to form an aligning means. In addition, the workpiece retaining means (,) are provided with loading means (,) for absorbing a force applied to the workpiece retaining means in an X direction, the force being generated due to contact between the rotating workpiece (,) and the polishing drums (,).


Find Patent Forward Citations

Hakomori, Shunji. (2001). Apparatus for polishing outer periphery of workpiece (U.S. Patent No. 6250995). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6250995

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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