The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2001
Filed:
Mar. 22, 2000
Applicant:
Inventors:
Wen-Pin Chang, Ilan, TW;
Ming-Lun Chang, Hsinchu, TW;
Assignee:
Winbond Electronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ; H01L 2/120 ;
U.S. Cl.
CPC ...
H01L 2/18242 ; H01L 2/120 ;
Abstract
The present invention provides a method for making the bottom electrode of a buried capacitor, which is characterized by protecting the non-bottom electrode region with a LPD oxide layer to prevent the impurities within the doped Si glass remaining in non-bottom electrode region from driving into the substrate during annealing, thus non-desired diffusing region connecting to the bottom electrode will be generated. Consequently, the leakage current existing in conventional buried capacitor will be effectively reduced according to the method of this present invention.