The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2001
Filed:
Aug. 17, 1999
Applicant:
Inventors:
Hsin-Tang Peng, Hsinchu, TW;
Jacson Liu, Hsinchu, TW;
Assignee:
Mosel Vitelic Inc., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; H05K 0/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; H05K 0/00 ;
Abstract
A method for fabricating a deep trench capacitor by using a patterned mask having a specific pattern thereon is provided. The specific pattern is formed by caving at least one side thereof in. The method for fabricating a deep trench capacitor includes the steps of providing a substrate, forming a deep trench having an opening by using the patterned mask with the above-described pattern within a predetermined rectangular area on the substrate, and utilizing the deep trench to form a deep trench capacitor.