The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Sep. 12, 1997
Larry F Rhodes, Silverlake, OH (US);
Andrew Bell, Lakewood, OH (US);
Saikumar Jayaraman, Cuyahoga Falls, OH (US);
John-Henry Lipian, Broadview Heights, OH (US);
Brian L. Goodall, Akron, OH (US);
Robert A. Shick, Strongsville, OH (US);
The B. F. Goodrich Company, Brecksville, OH (US);
Abstract
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source. The polymer repeating units are polymerized from polycyclic monomers in the presence of single or multicomponent catalyst systems containing a Group VIII metal