The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Mar. 18, 1999
Hisashi Kikuchi, Esashi, JP;
Katsumi Ishii, Tsukui-gun, JP;
Tokyo Electron, Tokyo-To, JP;
Abstract
A processing unit for a substrate comprises a partition,provided between an atmospheric area S,and an inert gas area S,The partition,has an opening,to communicate the atmospheric area S,and the inert gas area S,A door,is provided at the opening,to open and close it. Carrier holding device,is provided for holding a carrier,of the substrate in such a manner that the carrier,comes in contact with the opening,on the side of the atmospheric area. Inert gas replacing device,is provided for replacing a gas in the carrier,with an inert gas by introducing the inert gas into the carrier,when the door,closes the opening,and the carrier,comes in contact with the opening,on the side of the atmospheric area by the carrier holding device,This processing unit can perform the process of the substrate without increasing the concentration of the oxygen in the inert gas area S,by preventing leakage of the air from the atmospheric area S,into the inert gas area S