The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Mar. 08, 1999
Applicant:
Inventors:
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/176 ;
Abstract
A method of fabricating a shallow trench isolation structure is described. A mask layer is formed on the substrate. The mask layer and the substrate are patterned to form trenches in the substrate. The trenches comprise a smallest trench. A first isolation layer is formed on the mask layer to fill partially the trenches. A densification step is performed. A second isolation layer is formed on the first isolation layer to fill completely the trench. The first isolation layer and the second isolation layer are removed until the mask layer is exposed. The mask layer is removed.