The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Oct. 20, 1999
Applicant:
Inventors:
Juen-Kuen Lin, Kaohsiung, TW;
Chien-Hsin Lai, Kaohsiung Hsien, TW;
Hao-Kuang Chiu, Hsinchu, TW;
Fu-Yang Yu, Hsinchu, TW;
Assignee:
United Microelectronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
A method to maintain a consistent thin film thickness deposited by chemical vapor deposition is described in which method a compensative coefficient K is provided. The initial preset deposition time T,is multiplied by the compensative coefficient K to obtain an actual deposition time T, where T=K×T,. Using the actual deposition time T to conduct the deposition, the expected thickness of the thin film is obtained.