The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Sep. 17, 1998
Michael Armacost, Wallkill, NY (US);
Peter Hoh, Hopewell Junction, NY (US);
Richard S. Wise, Beacon, NY (US);
Wendy Yan, Somers, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
By providing a photoresist material with a protective polymer layer during the etching of an organic anti-reflective coating, undue damage to the photoresist material can be avoided during opening of the anti-reflective coating without the need for an oxidant. The preferred polymer chemistry system for producing such a result includes a fluorohydrocarbon-containing polymer mixture with a strong source of CF,, preferably C,F,. The etchant also includes a source of hydrogen selected from CH,F, C,HF,, or CH,F,, and a diluent selected from Ar, He or N,.