The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Jan. 25, 1999
Applicant:
Inventor:
Kuan-Yang Liao, Taipei, TW;
Assignee:
United Microelectronics Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ;
U.S. Cl.
CPC ...
H01L 2/18242 ;
Abstract
A method for fabricating a crown capacitor is able to form a deep UV photoresist layer having a cylindrical structure by using only one mask. A conductive layer, the main structure of a bottom electrode, is formed on the sidewall of the deep UV photoresist layer by performing a silylation process. A fairly small and high cylindrical structure is formed by the invention, so that the crown capacitor can be used in DRAM having a storage capacity higher than 64 MB. Also, there is no problem of registration because only one mask is used.