The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2001

Filed:

Jan. 19, 1999
Applicant:
Inventors:

Stanislav V. Aleshin, Moscow, RU;

Genadij V. Belokopitov, Moscow, RU;

Ranko Scepanovic, San Jose, CA (US);

Assignee:

LSI Logic Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract

A mask is provided which has a complex transmission function and which includes a transparent layer and a non-transparent layer. The transparent layer has three types of phase-shifting elements, each imparting a different phase shift relative to the others, with the phase-shifting elements alternating in both x and y dimensions. The non-transparent layer has holes arranged in an approximately equally spaced grid pattern defined by common points in borders of the phase-shifting elements. Centers of at least two holes in the non-transparent layer have different offsets from their corresponding common points. Also provided is a mask blank which includes a transparent layer and a non-transparent layer. The transparent layer has three types of phase-shifting elements, each imparting a different phase shift relative to the others, with the phase-shifting elements alternating in both x and y dimensions.


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