The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2001

Filed:

Apr. 15, 1998
Applicant:
Inventors:

Abha R. Singh, Garland, TX (US);

Girish Anant Dixit, Plano, TX (US);

Wei-Yung Hsu, Dallas, TX (US);

Guoqiang Xing, Dallas, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/144 ;
U.S. Cl.
CPC ...
H01L 2/144 ;
Abstract

A method to reduce the effective recess in conductive plugs,by performing an oxide etch or oxide CMP, selective to the conductive material in question. This method can be used for any conductive plug,(e.g. aluminum, tungsten, copper, titanium nitride, etc.). In addition, this method is also applicable in contact, via, and trench (damascene) applications. Furthermore, this process can advantageously be used in logic, SRAM, and DRAM applications.


Find Patent Forward Citations

Quick Actions:

Singh, Abha. (2001). Method for reducing recess for the formation of local interconnect and or plug trench fill for etchback process (U.S. Patent No. 6194313). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6194313

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…