The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2001

Filed:

Jul. 18, 2000
Applicant:
Inventors:

Hsi-Chuan Chen, Tainan, TW;

Sen-Huan Huang, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ;
U.S. Cl.
CPC ...
H01L 2/18242 ;
Abstract

A method of fabricating a semiconductor device having a landing plug is provided. First, a substrate is provided, which has active areas, wordlines stretching over the active areas and an isolation layer filling the gaps between the wordlines. Second, a pattern is defined and the isolation layer masked with the pattern is etched for the formation of bitline and node contacts, wherein the pattern has a protrusion which shortens the length of the bitline to wordline overlap formed thereby. Finally, the contacts are filled with a conducting layer.


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