The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2001
Filed:
Jun. 22, 1999
Yuri A. Eremin, Moscow, RU;
John C. Stover, Charlotte, NC (US);
Craig A. Scheer, Charlotte, NC (US);
ADE Optical Systems, Charlotte, NC (US);
Abstract
Particles are distinguished from pits, voids, scratches, and other subsurface defects in a surface of a substrate by impinging the defect with polarized light and integrating light scattered by the defect over a wide angular range to produce a total integrated response. Using a P-polarized incident light beam, particles are distinguished from subsurface defects by comparing the total integrated responses, which vary with changes in the incident angle. Alternatively, the defect is impinged with a P-polarized incident beam at a defined incident angle, and is then impinged with an S-polarized beam at the same incident angle. Total integrated responses are measured for both beams and a P-to-S ratio of the responses is calculated. Particles are distinguished from subsurface defects by comparing the P-to-S ratio to a predetermined threshold value which separates particles from subsurface defects.