The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Jan. 25, 1999
Applicant:
Inventors:
Ming-Hua Liu, Taichung, TW;
Chuck Chen, Feng-Shan, TW;
Shu-Ping Lin, Chiayi, TW;
Eddie Chen, Hsinchu, TW;
Ming-Tzong Yung, Hsinchu, TW;
Assignee:
United Microelectronics Corp, , TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; H01L / ; C23F / ;
U.S. Cl.
CPC ...
430331 ; 216 88 ; 216 92 ;
Abstract
A method of removing photoresist at the edge of waters in an integrated circuit the method comprising the following steps. A substrate having at least a MOS component region thereabove is provided. A photoresist layer is formed over the substrate. A pattern is defined on the photoresist layer by exposure and development. The photoresist layer at the edge of the substrate is removed by a chemical reagent and centrifugal effect.