The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2000

Filed:

Feb. 19, 1999
Applicant:
Inventors:

Saikumar Jayaraman, Twinsburg, OH (US);

Brian Leslie Goodall, Akron, OH (US);

Larry Funderburk Rhodes, Silver Lake, OH (US);

Robert Adam Shick, Strongsville, OH (US);

Richard Vicari, Strongsville, OH (US);

Robert David Allen, San Jose, CA (US);

Juliann Opitz, San Jose, CA (US);

Ratnam Sooriyakumaran, San Jose, CA (US);

Thomas Wallow, Union City, CA (US);

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526281 ; 526259 ; 526270 ; 526283 ; 526286 ; 526332 ; 526333 ; 526334 ; 526313 ; 526308 ; 526326 ; 526172 ;
Abstract

Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.


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