The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2000
Filed:
Jun. 05, 1998
Applicant:
Inventor:
Norio Semba, Kumamoto-ken, JP;
Assignee:
Tokyo Electron Ltd., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03D / ;
U.S. Cl.
CPC ...
355 27 ; 355 30 ; 396611 ;
Abstract
A processing system includes a coating/developing station for performing either a solution processing for processing a substrate using solution or a thermal processing for thermally processing the substrate, and a transfer unit for transferring the substrate into and from the coating/developing station. A casing encases the coating/developing station and the transfer unit. An interface section, provided in the casing, transfers the substrate into and from an external exposure machine for exposing the resist on the substrate. A pressure setting device sets a pressure in the casing to be lower than a pressure in the external exposure machine.