The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2000

Filed:

Feb. 04, 1997
Applicant:
Inventors:

Robert M Gutowski, Glen Oaks, NY (US);

Vincent Calia, Greenlawn, NY (US);

Alan M Todd, Princeton, NJ (US);

Assignee:

Advanced Energy Systems, Inc., Bethpage, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21G / ;
U.S. Cl.
CPC ...
2504931 ; 2504921 ;
Abstract

A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturing a substantial portion of the gas so as to mitigate contamination caused thereby. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like.


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