The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
Aug. 03, 1999
Applicant:
Inventors:
Gautam Bhandari, Danbury, CT (US);
Thomas H Baum, New Fairfield, CT (US);
Chongying Xu, New Milford, CT (US);
Assignee:
Advanced Technology Materials, Inc., Danbury, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C09K / ; C07F / ; C07F / ; B05D / ;
U.S. Cl.
CPC ...
106-118 ; 10628714 ; 10628718 ; 1062867 ; 438687 ; 427124 ; 4272481 ; 427250 ; 556 12 ; 556110 ; 556112 ; 556117 ; 556465 ;
Abstract
Copper precursor formulations, including a copper precursor with at least one of (a) water, (b) a water precursor and (c) a non-ligand organic hydrate, are useful in CVD processes, e.g., in liquid delivery chemical vapor deposition, for forming a copper-containing material on a substrate. The disclosed copper precursor formulations are particularly useful in the formation of copper layers in semiconductor integrated circuits, e.g., for metallization of interconnections in such semiconductor device structures.