The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2000
Filed:
Dec. 02, 1997
Ming-Lun Chang, Hsinchu, TW;
Winbond Electronics Corp., Hsinchu, TW;
Abstract
According to the manufacturing method for capacitors, which characterizes in using trench technique that is usually used in DRAM processes to form multiple bottom electrodes of the capacitor in a trench's sidewall, then increase the whole surface of the capacitor and enhance the charge stored in the electrodes. The capacitance of the capacitor manufactured by this invention is double that manufactured by conventional methods. In addition, the structure of the capacitor manufactured by this invention is multiple stages; therefor the depth of trenches is less than that manufactured by conventional methods. This manufacturing method according to the invention improves many difficulties existing in conventional processes.