The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2000
Filed:
Mar. 30, 1998
Richard E Shultz, Austin, TX (US);
Progressive System Technologies, Inc., Austin, TX (US);
Abstract
A programmable substrate support including a first substrate support that mates with a second substrate support to enable automatic switching between different types of substrates. The first substrate support is configured to support a first type of substrate and to mount to a substrate positioning system to enable handling of substrates of the first type. The second substrate support is configured to support a second type of substrate, and is further configured to mate with the first substrate support to form a mated configuration. The mated configuration enables the substrate positioning system to handle substrates of the second type. In a semiconductor wafer processing embodiment, the first substrate support is an end effector capable of handling wafers of a first size, such as 200 millimeter (mm) wafers, and the second substrate support is another end effector capable of handling wafers of a second size, such as 300 mm wafers. Of course, any size and type of substrate is contemplated. The first and second end effectors include complementary couplers that enables the second end effector to mount on top of the first end effector in the mated configuration. The complementary couplers may further include locating features to enable repeatable alignment between the end effectors.