The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2000
Filed:
Aug. 25, 1998
Fujitsu Limited, Kawasaki, JP;
Abstract
The present invention relates to a charged particle beam exposure method, wherein exposure data having exposure pattern data for each of a plurality of sub-fields located in a main field are acquired from pattern data for each of the sub-fields and a sample is exposed in accordance with the exposure data. The method comprises the steps of: forming a plurality of areas having different shapes, in accordance with patterns in the sub-fields, and acquiring pattern densities in the areas; correcting the pattern densities in accordance with pattern densities for areas surrounding the areas and with distances between the areas; generating auxiliary exposure patterns in the areas when the pattern densities for the areas are lower than a predetermined reference exposure density; and exposing the sample in accordance with the exposure data obtained by adding the data for the auxiliary exposure patterns to the pattern data. According to the present invention, a variable area can be formed, the number of areas can be reduced, and data processing can be performed more efficiently.