The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2000
Filed:
Jun. 26, 1998
Michael A Marcus, Honeoye Falls, NY (US);
Jiann-Rong Lee, Webster, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method for determining the optical retardation of an anisotropic material. A beam of light is directed toward a sample of the material and a portion of the reflected beam is collected from the optical interfaces of the material and directed toward an interferometer. The resulting interference signal is analyzed to determine the retardation. The retardation is determined as being the distance between particular peaks of the interference signal. In a further embodiment, light from multiple wavelength light sources is directed toward the sample of the material.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile