The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2000
Filed:
Dec. 18, 1998
Michael A Marcus, Honeoye Falls, NY (US);
Jiann-Rong Lee, Webster, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method for processing interferometric measurement data representative of a physical property of an object, such as the thickness of material M. A plurality of interference signals are acquired and stored with respect to a length L, and a dimension of length L over which the plurality of interference signals were acquired is determined. A location of all peaks of the interference signals is then determined with respect to a start position of the acquisition of the plurality of interference signals. The interferometer peaks which are representative of the physical property of the object are then determined and stored.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile