The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 29, 2000
Filed:
Dec. 16, 1996
Applicant:
Inventors:
Peter K Loewenhardt, Santa Clara, CA (US);
Gerald Zheyao Yin, Sunnyvale, CA (US);
Philip M Salzman, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
156345 ; 1187 / ; 1187 / ; 20429837 ;
Abstract
The invention confines the plasma within the chamber without relying entirely on the chamber walls by introducing a magnetic field across an area or plane through which plasma flow is to be stopped. For example, in order to prevent plasma from leaking or flowing through openings necessarily provided the chamber walls, a magnetic field is established at the entrance of the reactor chamber to such an opening, by placing a pair of opposing magnetic poles across the opening, for example. The magnetic field is sufficiently strong to prevent plasma leaking through the opening.