The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 1999
Filed:
Jun. 18, 1997
Tadaaki Shinozaki, Kawasaki, JP;
Nobutaka Fujimori, Fujisawa, JP;
Toshio Matsuura, Tokyo, JP;
Toshinobu Morioka, Fujisawa, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Positions of a plurality of marks formed in a correction mask are measured as first positions. A plurality of marks in the correction mask are transferred onto a photosensitive substrate, and transferred positions of the plurality of marks are determined as second positions. Subsequently, amounts of deviation of the first positions from the second positions are determined as correction data. After that, positions of a plurality of marks formed in an exposure mask are measured as third positions by a method similar to that used for measurement of the first positions, and the third positions are corrected on the basis of the correction data.