The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 1999

Filed:

Apr. 09, 1998
Applicant:
Inventors:

Jeong-Hwan Son, Daejeon, KR;

Wouns Yang, Chungcheongbuk-do, KR;

Assignee:

Semicon Co., Ltd., Chungcheongbuk-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C / ;
U.S. Cl.
CPC ...
365182 ; 365175 ;
Abstract

Provided is a semiconductor device, including: a semiconductor substrate; a first conductive type well which is formed on the semiconductor substrate; first and second field oxide layers which are formed on the well, defining the active region of the device; a node junction, where second conductive type impurity ions are heavily doped, making contact with the field oxide layer in the well; a gate electrode formed by interposing a gate oxide layer between the second field oxide layer and the node junction on the well; a switching device made from an interlevel insulating layer, for covering the gate electrode, and having a contact hole exposing the node junction on the semiconductor substrate; a storage electrode which makes contact with the node junction through the contact hole; a dielectric layer formed on the storage electrode; and a memory device made of a plate electrode which is formed on the dielectric layer.


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